JPH0433654U - - Google Patents
Info
- Publication number
- JPH0433654U JPH0433654U JP7347490U JP7347490U JPH0433654U JP H0433654 U JPH0433654 U JP H0433654U JP 7347490 U JP7347490 U JP 7347490U JP 7347490 U JP7347490 U JP 7347490U JP H0433654 U JPH0433654 U JP H0433654U
- Authority
- JP
- Japan
- Prior art keywords
- abatement device
- exhaust gas
- pump
- gas abatement
- connection diagram
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990073474U JP2574816Y2 (ja) | 1990-07-09 | 1990-07-09 | 排ガス除害装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990073474U JP2574816Y2 (ja) | 1990-07-09 | 1990-07-09 | 排ガス除害装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0433654U true JPH0433654U (en]) | 1992-03-19 |
| JP2574816Y2 JP2574816Y2 (ja) | 1998-06-18 |
Family
ID=31612320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990073474U Expired - Lifetime JP2574816Y2 (ja) | 1990-07-09 | 1990-07-09 | 排ガス除害装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2574816Y2 (en]) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009088308A (ja) * | 2007-10-01 | 2009-04-23 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| JP2023532775A (ja) * | 2020-07-09 | 2023-07-31 | ファイファー バキユーム | 真空ラインおよび真空ラインの制御方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5677381A (en) * | 1979-11-30 | 1981-06-25 | Anelva Corp | Exhaust system of dry etching unit |
| JPS60159178A (ja) * | 1984-01-27 | 1985-08-20 | Nec Corp | ドライエツチング装置 |
| JPS63137736A (ja) * | 1986-11-28 | 1988-06-09 | Asahi Glass Co Ltd | エッチング排ガス除害方法 |
| JPH01188684A (ja) * | 1988-01-20 | 1989-07-27 | Seiko Epson Corp | ケミカルドライエッチング用真空排気装置 |
-
1990
- 1990-07-09 JP JP1990073474U patent/JP2574816Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5677381A (en) * | 1979-11-30 | 1981-06-25 | Anelva Corp | Exhaust system of dry etching unit |
| JPS60159178A (ja) * | 1984-01-27 | 1985-08-20 | Nec Corp | ドライエツチング装置 |
| JPS63137736A (ja) * | 1986-11-28 | 1988-06-09 | Asahi Glass Co Ltd | エッチング排ガス除害方法 |
| JPH01188684A (ja) * | 1988-01-20 | 1989-07-27 | Seiko Epson Corp | ケミカルドライエッチング用真空排気装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009088308A (ja) * | 2007-10-01 | 2009-04-23 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| JP2023532775A (ja) * | 2020-07-09 | 2023-07-31 | ファイファー バキユーム | 真空ラインおよび真空ラインの制御方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2574816Y2 (ja) | 1998-06-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R323111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |